Last Updated： Aggregation Period:Aug 27, 2025～Sep 23, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Aug 27, 2025～Sep 23, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Aug 27, 2025～Sep 23, 2025
This ranking is based on the number of page views on our site.
1～10 item / All 10 items
It is ideal for manufacturing equipment for substrates such as organic EL!
This is a device that performs the process of sending substrates through a series of steps, including cleaning brushes, HPMJ, MS, final rinsing, and water draining, to the discharge section using a sheet-by-sheet method.
Effective for removing particles between fine pattern patterns! Easy to attach and detach the brush unit!
The substrate and film brush cleaning machine "VSC-727" can flexibly adapt to the shapes between patterns thanks to its special brushes. Unlike adhesive rollers, it is effective in removing particles between fine patterns. It employs a suction conveyor to stably transport thin substrates. 【Features】 - The brush unit can be easily detached and attached without tools. - Equipped with a gap adjuster, it accommodates substrates ranging from 60μ to 3.2mm. For more details, please contact us or download the catalog.
Significant reduction in footprint and purchase costs, increased throughput, and substantial improvement in substrate quality.
■Suitable for various WET processes such as etching, RCA cleaning, and developing ■Ideal for organic stripping/lift-off processes that do not use ultrasound ◎Compatible with high-pressure jet and spray treatments ◎When using ultrasound for effective removal of dry-etch residues and burrs during lift-off, the "Spin Dip Processor" is recommended. ■Full process of chemical solution ⇒ rinse ⇒ drying in a single chamber, supporting Dry-In/Dry-Out ◎Conventional method: 2-chamber configuration (substrate remains in a chemical solution during transfer between chambers) ◎New method: UDS type uses a 1-chamber configuration. ■Basic operation of the substrate ◎ "Upper section... LD of the substrate" ⇒ "Lower section... chemical treatment" ⇒ ⇒ "Middle section... rinse and dry" ⇒ "Upper section... ULD of the substrate" ■The patented isolation plate ensures the concentration of the chemical solution during reuse. ◎Since there is no dilution from rinse water contamination, the chemical solution can be temperature-controlled and reused. *For more details, please refer to the PDF document or feel free to contact us. Wafer, batch-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, resist stripping equipment, resist coating equipment, cleaning equipment, megasonic, photoresist, photolithography process.
DMBFY company's circuit board cleaning machine
■Features - Prevents product contamination due to oil by using λ-CHAIN that does not require refueling - Utilizes a variety of transfer rolls tailored to specific characteristics even within the same section, maximizing cleaning and processing capabilities - All nozzle bars are designed for one-touch and clamp attachment, minimizing loss during maintenance and repairs. *For additional features and information about DMBFY, please download and view the catalog.*
Introduction to substrate cleaning and alternative fluorocarbon "Cleaning Solution Asahi Clean AK-225".
"Ky Technical Report" is a technical document that publishes technical information and special responses related to the manufacturing operations conducted by K-Y Electronics. In issue No. 030, we introduce "About Circuit Board Cleaning (1)." After soldering, eutectic products and cleaning-designated products undergo a precise cleaning process known as "flux cleaning." The alternative refrigerant HCFC-225, "Asahi Clean AK-225," used in flux cleaning, has been legally mandated to be discontinued for sale by the end of 2019. This document includes considerations using data and tables regarding cleaning agents and cleaning equipment that can replace alternative refrigerant cleaning. [Contents] ■ About Circuit Board Cleaning / Cleaning Agent Asahi Clean AK-225 ■ Reference Figure 1 "Types and Uses of Refrigerant Gases" ■ Reference Figure 2 "HCFC Reduction Targets in Our Country" ■ Summary of Refrigerants and Alternative Refrigerants *For more details, please refer to the PDF document or feel free to contact us.
![Small Circuit Board Cleaning Machine "Ecclear" [Ideal for cleaning small circuit boards!]](https://image.mono.ipros.com/public/product/image/f14/2000373354/IPROS35647962453910998082.png?w=280&h=280)
A compact board cleaning machine specialized for cleaning and drying small substrates under 2 inches! Strongly supports the development and device implementation of new materials!
"Ecclear" is a device for cleaning and drying small-sized substrates with a diameter of less than 2 inches. With a uniquely developed cleaning and drying mechanism specifically for small substrates, it achieves a high level of cleanliness. It is ideal for cleaning and drying small substrates used in research and development, as well as biochips, optical components, and MEMS parts. 【Features】 ■ Developed a brush that exhibits high adhesion removal capability with low damage ■ Drying mechanism that is eccentric due to centrifugal force (Patent No: WO2015-098699) ■ HEPA filter ■ Mass production support is possible with a transport option *For more details, please request documentation or view the PDF data available for download.
The substrate will undergo various cleaning and drying processes through horizontal transport.
The WET process equipment for single-sided substrate cleaning performs UV cleaning, brush cleaning, shower spray cleaning, ultrasonic cleaning, and drying treatment while transporting the substrate horizontally. The WET equipment technology from Denshi Giken Co., Ltd., including cleaning and other spins, can meet the needs of a wide range of industries such as semiconductors, LCDs, medical, and food industries, by cleaning wafers, glass substrates, printed circuit boards, metal substrates, and more. 【Features】 ○ Improved hydrophilicity before shower spray cleaning using UV/O3 ○ Parallel processing of UV cleaning, shower spray cleaning, drying, and other processes ○ High efficiency of natural drop and replacement through substrate inclined washing function For more details, please contact us or download the catalog.
Seal off product contamination from oil! We use a variety of transfer rolls tailored to specific characteristics, even within the same section.
This product is a final substrate cleaning machine for MSAP, copper plating, bumps, etc. It maximizes cleaning and processing capabilities using a variety of transport rolls tailored to specific features, even within the same section. Additionally, with the application of magnetic drive, it features a non-contact method for semi-permanent use and a structure that prevents foreign object generation. 【Features】 ■ Lower exhaust application ■ Water cleaning available inside the chamber ■ Individual pressure adjustment for knives ■ Thin plate compatibility and pressure tilt prevention ■ Top-down method application ■ Enhanced drying capability *For more details, please refer to the PDF materials or feel free to contact us.
Production processes compatible with industrial equipment products! Using highly regarded glycol ether-based cleaning agents with proven results.
We offer "substrate cleaning" services. We use glycol ether-based cleaning agents that have a proven track record and high reputation for cleaning assembled substrates. We can accommodate large substrates with sizes up to 500×400. Please feel free to contact us when you need our services. 【Equipment Available】 ■ Vacuum Cleaning and Drying Machine (HEARVY-4252 / CleanBee) - A cleaning machine that replaces traditional fluorocarbon and semi-aqueous cleaning machines - Uses glycol ether-based cleaning solution essential for flux cleaning - Supports large substrates with a maximum size of 500×450 *For more details, please refer to the PDF document or feel free to contact us.
From small-scale cleaning to automatic cleaning! Utilizing developed cleaning technology to achieve reduced environmental impact.
The "Cleaning Equipment" is a product handled by Shimada Technology Co., Ltd. Utilizing cleaning and drying technologies developed in the semiconductor and flat panel fields, we respond to various cleaning needs such as high quality and low damage. Additionally, through equipment design tailored to the items being cleaned, we provide a range of precision cleaning devices that achieve space-saving and utility-saving solutions, contributing to the reduction of environmental impact. [Features] ■ Developed cleaning technology ■ Achieves reduction of environmental impact ■ Responds to various cleaning needs ■ Wide range of support from small-scale cleaning to automatic cleaning *For more details, please refer to the PDF materials or feel free to contact us.
